METHOD AND DEVICE FOR PRODUCING AN ANTI-REFLECTION OR PASSIVATION LAYER FOR SOLAR CELLS

摘要

A method and an apparatus for producing an anti-reflection or passivation layer for a solar cell are provided to improve coating characteristics of an anti-reflection layer or a passivation layer by controlling temperature of a substrate. A wafer loading process is performed to load an Si wafer(5) into a deposition chamber(1). A preheating process is performed to preheat the Si wafer at the temperature of 400 degrees centigrade and more. A sputtering process is performed to deposit an anti-reflection or passivation layer including hydrogen. The Si wafer is a doped Si wafer. The anti-reflection or passivation layer is a SiN:H layer. The preheating process is performed by using a heat-radiating element(16). The heat-radiating element is an infrared heater.