| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which can accurately detect the occurrence of abnormality in a concentration measuring system of a chemical solution, by monitoring the supply of the chemical solution. SOLUTION: When an abnormality occurs in the concentration measuring system of a chemical solution, there is a difference between an amount (normal value) supplied within a certain period of time in normal supply and stored in an alarm value memory 57 and an actual value, obtained within the certain period of time and calculated by a supply amount adding section 63. Thus a decision section 59 can decide the occurrence of the abnormality, based on the comparison. Since the supply amount adding section 63 adds up the amount of the chemical solution, supplied from a chemical solution feed pipe 39 within a predetermined time under the control of a concentration measuring section 53 and a concentration control section 55, and the supply amount adding section 63 belongs to a different system from the concentration measuring section 53 for measuring the concentration of a processing solution supplied to a processing bath 1 through a feed pipe 17, abnormalities, irrespective of the malfunction of the concentration measuring section 53 can be corrected. COPYRIGHT: (C)2009,JPO&INPIT
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