| 摘要 |
PROBLEM TO BE SOLVED: To provide a transparent conductive film that has a coating film and a sputter film, and improves conductivity in thickness direction compared with conventional conductive films, and to provide a manufacturing method for such a transparent conductive film. SOLUTION: A sol obtained from a solution containing metal alkoxide is applied to a substrate 14, and the applied sol is dried to form a first transparent conductive film (coating film 11), to which plasma processing is carried out. On the coating film 11, a second transparent conductive film (sputter film 12) is formed by a sputtering method to complete a transparent conductive film 10. Preferably, the plasma processing is carried out, for example, by making gas ion generated by the plasma discharging collide against the coating film 11. COPYRIGHT: (C)2009,JPO&INPIT
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