| 发明名称 |
ANALYSIS METHOD OF VERY SMALL AMOUNT OF Pd, Rh AND Ru AND HIGH-FREQUENCY PLASMA MASS ANALYZER USED THEREIN |
| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for analyzing a very small amount of Pd, Rh and Ru with high precision by a high-frequency plamsa mass analyzer. SOLUTION: The method for analyzing a trace amount of Pd, Rh or Ru as a measuring target element includes a process (1) for pretreating a sample by an alkali melting method using a sodium compound and a process (2) for analyzing the pretreated sample by the high-frequency plasma mass analyzer. In the process (2), the interval between a sampling cone and a skimmer cone is set so that all of the concentration of<SP>40</SP>Ar<SP>65</SP>Cu interfering with Pd, the concentrations of<SP>40</SP>Ar<SP>63</SP>Cu and<SP>40</SP>Ar<SP>40</SP>Ar<SP>23</SP>Na interfering with Rh and the concentrations of<SP>38</SP>Ar<SP>63</SP>Cu and<SP>40</SP>Ar<SP>38</SP>Ar<SP>23</SP>Na interfering with Ru become a value of 0.05 ppb or lower to perform analysis. COPYRIGHT: (C)2009,JPO&INPIT
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| 申请公布号 |
JP2008232808(A) |
申请公布日期 |
2008.10.02 |
| 申请号 |
JP20070072442 |
申请日期 |
2007.03.20 |
| 申请人 |
NIKKO KINZOKU KK;SII NANOTECHNOLOGY INC |
发明人 |
KAMIMURA KENICHI;KAWADA SATORU;TSUCHIYA KOJI |
| 分类号 |
G01N27/62;H01J49/06;H01J49/10 |
主分类号 |
G01N27/62 |
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