发明名称 EVAPORATION SOURCE, VAPOR DEPOSITION APPARATUS AND METHOD OF FILM FORMATION
摘要 <p>A vapor deposition apparatus that is capable of forming an organic thin film of high quality. In vapor deposition apparatus (1), tray (41) is disposed in evaporation chamber (15), and supply unit (30) feeds evaporation material (16) onto the tray (41). The tray (41) is mounted on mass meter (49), and the mass of evaporation material (16) disposed on the tray (41) is measured. Control unit (45) compares the measurement value with a reference value, making the supply unit (30) feed any required amount of evaporation material (16). As the evaporation material (16) is replenished whenever required, there is no event in which the evaporation material (16) is used up in the midst of film formation and is further no event in which a large amount of evaporation material (16) is heated for a prolonged period of time, thereby avoiding deterioration of the evaporation material (16).</p>
申请公布号 WO2008117690(A1) 申请公布日期 2008.10.02
申请号 WO2008JP54876 申请日期 2008.03.17
申请人 ULVAC, INC.;NEGISHI, TOSHIO 发明人 NEGISHI, TOSHIO
分类号 C23C14/12;C23C14/24 主分类号 C23C14/12
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