发明名称 METHOD FOR FABRICATING ORGANIC THIN FILM TRANSISTOR SUBSTRATE
摘要 <p>A method for manufacturing a thin film transistor substrate is provided to improve electrical characteristics of a thin film transistor by neutralizing a surface of a gate insulating layer. A gate electrode(20) is formed on a substrate(10). A gate insulating layer(30) is formed on the gate electrode. A channel region is defined on the gate insulating layer by using a source electrode(260) and a drain electrode(265). A neutralization process is performed to neutralize the channel region. A bank insulating layer(70) is formed on the source electrode and the drain electrode. An organic semiconductor layer(100) is formed on a predetermined region which is prepared by the bank insulating layer.</p>
申请公布号 KR20080088251(A) 申请公布日期 2008.10.02
申请号 KR20070030975 申请日期 2007.03.29
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, YOUNG MIN;KIM, BO SUNG;AHN, BO KYOUNG
分类号 H01L29/786;H01L51/00 主分类号 H01L29/786
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