MANUFACTURING METHOD OF PHASE SHIFT MASK AND PHASE SHIFT MASK

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method of a phase shift mask which has a binary pattern region and a plurality of phase shift pattern regions on one mask and also has superior size precision and positioning precision and high quality using photolithography of≤65 nm in half pitch on a wafer, and the phase shift mask obtained by the manufacturing method.

SOLUTION: Disclosed is the manufacturing method in which a translucent film and a light shielding film, and an intermediate film stopping etching using chlorine system upon occasion are provided, and chlorine-based gas and fluorine-based gas are used in combination as dry etching gas to carry out patterning in sequence without damaging a lower layer.

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