| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high sensitivity, capable of obtaining a satisfactory spacer shape even at an exposure amount of ≤1,000 J/m<SP>2</SP>, excellent in elastic recovery, rubbing resistance, adhesion to a transparent substrate and heat resistance, excellent further in developability, and capable of forming a spacer for a liquid crystal display element free of irregular surface roughness on an obtained pattern surface. <P>SOLUTION: The radiation-sensitive resin composition comprises [A1] a polymer obtained by reacting a copolymer of (a1) at least one selected from the group comprising unsaturated carboxylic acids and unsaturated carboxylic acid anhydrides and (a2) an unsaturated compound containing one or more hydroxyl groups in one molecule with an ω-(meth)acryloyloxyalkyl isocyanate, and [A2] a copolymer of (a1) at least one selected from the group comprising unsaturated carboxylic acids and unsaturated carboxylic acid anhydrides and (a3) an unsaturated compound having an oxiranyl group or an oxetanyl group. <P>COPYRIGHT: (C)2009,JPO&INPIT |
