发明名称 POLYCYCLIC ESTER CONTAINING ELECTRON-WITHDRAWING SUBSTITUENT AND LACTONE SKELETON, ITS POLYMER COMPOUND AND PHOTORESIST COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a novel polycyclic ester which contains an electron-withdrawing substituent and a lactone skeleton and is useful as a monomer component etc. of a highly functional polymer etc., a polymer compound and a photoresist resin composition. <P>SOLUTION: The polycyclic ester containing an electron-withdrawing substituent and a lactone skeleton is represented by formula (1) (wherein R<SP>a</SP>is a hydrogen atom, a 1-6C alkyl group or the like optionally having a halogen atom; R<SP>1</SP>is a halogen atom, a 1-6C alkyl group or the like optionally having a halogen atom; and A is a 1-6C alkylene group, an oxygen atom, a sulfur atom or no bond). <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008231059(A) 申请公布日期 2008.10.02
申请号 JP20070075479 申请日期 2007.03.22
申请人 DAICEL CHEM IND LTD 发明人 INOUE KEIZO;IWAHAMA TAKAHIRO;NISHIMURA MASAMICHI;TSUTSUMI KIYOHARU
分类号 C07D307/00;C08F20/28;G03F7/039 主分类号 C07D307/00
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