发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device capable of narrowing down a range wherein two transistors have variance in characteristic when difference between characteristics of the two transistors need to be made small. SOLUTION: The semiconductor device has a first transistor 10a having a first gate electrode 4a, a low-density impurity region 6a, and a first impurity region 7a serving as a source and a drain, a second transistor 10b having a second gate electrode 4b and a second impurity region 7b serving as a source and drain and not having a low-density impurity region, and a third transistor 10c having a third gate electrode 4c and a third impurity region 7c serving as a source and a drain and not having a low-density impurity region. The second transistor 10b and third transistor 10c are in nearly the same shapes. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008235693(A) 申请公布日期 2008.10.02
申请号 JP20070075045 申请日期 2007.03.22
申请人 SEIKO EPSON CORP 发明人 NAKANO TAKUYA;SAWADA JUN
分类号 H01L21/8234;H01L21/28;H01L21/283;H01L21/8238;H01L27/088;H01L27/092 主分类号 H01L21/8234
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