发明名称 METHOD OF PROCESSING WAFERS IN A SEQUENTIAL FASHION
摘要 A method and apparatus for processing two substrates is provided. The apparatus comprises a chamber having an upper opening, a lower process volume adapted to retain a process solution, and an upper process volume, wherein the chamber is proportioned to vertically process two substrates. The apparatus further comprises a substrate transfer assembly adapted to transfer two substrates in and out of the chamber through the upper opening and one or more megasonic transducers disposed in the chamber, wherein the one or more megasonic transducers are configured to direct megasonic energy towards the process solution retained in the chamber.
申请公布号 US2008236615(A1) 申请公布日期 2008.10.02
申请号 US20070692791 申请日期 2007.03.28
申请人 MIMKEN VICTOR B;TOLLES ROBERT D 发明人 MIMKEN VICTOR B.;TOLLES ROBERT D.
分类号 H01L21/02 主分类号 H01L21/02
代理机构 代理人
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