| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a chemically amplified resist composition which exhibits high resolution and gives good line edge roughness. <P>SOLUTION: The chemically amplified resist composition comprises an acid generator comprising an onium salt represented by formula (I) and a sulfonium salt represented by formula (II), and a resin which has a polymerized unit having an acid-labile group and which itself is alkali-insoluble or slightly alkali-soluble but becomes alkali-soluble under the action of an acid. In the formula (I), R<SP>21</SP>is a 1-20C optionally substituted hydrocarbon group or a 3-30C optionally substituted cyclic hydrocarbon group, wherein a contained carbon atom may be arbitrarily substituted by a carbonyl group or an oxygen atom; Q<SP>1</SP>and Q<SP>2</SP>are each a fluorine atom or a 1-6C perfluoroalkyl group; and A<SP>+</SP>is an organic counter cation. In the formula (II), A<SP>+</SP>denotes the same meaning as A<SP>+</SP>in the formula (I); and E<SP>-</SP>is an organic counter anion. <P>COPYRIGHT: (C)2009,JPO&INPIT |
