| 摘要 |
PROBLEM TO BE SOLVED: To provide a novel apparatus and method capable of adjusting the polarized light of a radiation beam. SOLUTION: In an illuminating device of a lithography apparatus, an illuminating mode regulation element 2 converts a radiation beam PB into a dipole form 6. A proportion of the radiation beam having a predetermined angle range passes through a polarized light rotator 10a. The polarized light rotator 10a can translate in a direction 12a that crosses an optical axis of the lithography apparatus. The polarized light rotator 10a acts so as to adjust the polarized light of the radiation that passes through itself. Then, another proportion of the radiation beam having a different angle range passes through a different polarized light rotator 10b. The polarized light rotator 10b can translate in a direction 12b that crosses the optical axis of the lithography apparatus. The polarized light rotator 10b acts so as to adjust the polarized light of the radiation that passes through itself. The polarized light rotators 10a, 10b may include a polarized light rotator in the form of, for example, a half-wavelength plate and 1/4 wavelength plate, or in other forms. COPYRIGHT: (C)2009,JPO&INPIT
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