| 摘要 |
PROBLEM TO BE SOLVED: To improve a S/N ratio and a contrast of a detection signal as an effect due to a charge is reduced. SOLUTION: In a substrate inspection method, a high-resistance inspecting thin film F10 is deposited on a surface of a to-be-inspected substrate S prior to imaging by use of an electron beam. A material, a film thickness and a composition of the thin film F10 and an irradiation condition of the electron beam in an imaging apparatus are selected so as to obtain an inspection image having a characteristic corresponding to an inspection purpose. COPYRIGHT: (C)2009,JPO&INPIT
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