| 摘要 |
The vacuum evaporation apparatus includes a vacuum chamber, a substrate holder which is disposed in the vacuum chamber and holds a substrate, and an evaporation source which is disposed in the vacuum chamber and evaporates a film-forming material. The substrate holder has a substrate holding portion which is made of a first material having a heat conductivity of at least 100 W/m.K and a specific gravity of up to 4.0x10<SUP>3 </SUP>kg/m<SUP>3 </SUP>and a vapor deposition area-regulating member which is made of a second material that is different from the first material and has a melting point of at least 1300° C. This apparatus is capable of preventing a film-forming material from being deposited on the substrate holder surface while keeping the temperature within the substrate holder uniform.
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