| 发明名称 |
PEB EMBEDDED EXPOSURE APPARATUS |
| 摘要 |
The present disclosure provides a lithography apparatus. The apparatus includes an exposure module designed for exposure processing; a baking module embedded in the exposure module and designed for post exposure baking (PEB); and a control module designed to control the exposure module and the baking module.
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| 申请公布号 |
US2008241760(A1) |
申请公布日期 |
2008.10.02 |
| 申请号 |
US20070740129 |
申请日期 |
2007.04.25 |
| 申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
LEE FENG-NING;CHEN YUNG-CHENG;KAO YAO-HWAN;KO LI-JEN;LIN CHIN-HSIANG |
| 分类号 |
G03C5/00 |
主分类号 |
G03C5/00 |
| 代理机构 |
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