| 摘要 |
<P>PROBLEM TO BE SOLVED: To solve the problem that development of resist is impeded to fail to homogeneously develop the resist when there is a particle produced due to a contact between a barrier film and a resist film regarding liquid immersion lithography, and the shape of a pattern eventually becomes defective if there remains a resist film which is dissolved and left after development. <P>SOLUTION: In addition to an alkali-soluble polymer, a polycarboxylic acid compound or polyhydric alcohol compound having a plurality of carboxyl groups is added to a material for barrier film formation. Consequently, the polycarboxylic acid compound or polyhydric alcohol compound sticks on a resist film surface and particles sticking on the resist film surface are removed when the barrier film is removed. Further, when the barrier film is removed at the same time with development, the resist film can be prevented from be dissolved and left. <P>COPYRIGHT: (C)2009,JPO&INPIT |
