| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a liquid immersion lithography apparatus which can prevent a liquid supplied into a space between a projection lens and a substrate (e.g., wafer) from staying in a space other than the liquid stay space by precisely moving the liquid together with the substrate. <P>SOLUTION: A liquid immersion lithography apparatus 100 comprises a liquid supply/exhaust device 200 for supplying or exhausting a liquid into or from a liquid holding space defined between a projection optical mechanism 140 and a wafer 50. The liquid supply/exhaust device 200 includes a liquid supply unit 210 for supplying a liquid L into the liquid holding space, a liquid collection unit 220 for collecting the liquid L supplied into the liquid holding space, a liquid holding member 230 having such a water repellent characteristic as to hold the liquid L supplied into the liquid holding space, and a voltage applying means 240 for applying a voltage to the liquid holding member 230. <P>COPYRIGHT: (C)2009,JPO&INPIT |
