METHOD FOR MANUFACTURING OPTICAL DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing an optical device having electrode wiring suitable for thin film slab structure represented by 2DPC slab structure.

SOLUTION: The method for manufacturing the optical device comprises the steps of: preparing a first substrate having a part to be a first core layer of the optical device; preparing a second substrate having a part to be a second core layer of the optical device and a part to be a low refractive index insulating clad layer; performing impurity doping for forming a p type or n type area at the part to be the second core layer of the second substrate; forming a core layer by joining the part to be the first core layer of the first substrate and the part to be the second core layer of the second substrate; removing the first substrate while leaving the part where the first core layer is formed; forming desired optical device structure in the core layer; forming a low refractive index insulating film on the core layer by removing a part of the part where the first core layer is formed and exposing a part of the part where the second core layer is formed; removing a part of the low refractive index insulating film; and forming the electrode wiring to be connected to the part where the first core layer is formed and the part where the second core layer is formed.

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