发明名称 FILM DEPOSITION SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a film deposition system which uniformly sprays a mist even for a large-area substrate by neither requiring a complex drive controlling constitute nor making equipment large and makes it possible to make the thickness of a film uniform. SOLUTION: The film deposition system 1, depositing a thin film on the whole surface of a body 2 to be treated by a spray pyrolysis method, includes at least a supporting means 11 for loading the body to be treated and a discharge means 12 for spraying the mist 3 consisting of a raw solution for the thin film toward the whole surface of the body to be treated, wherein a nozzle 13, arranged in the discharge means, has a first part 13a as the air carrying-in side and a second part 13b as the air carrying-out side. The second part, in which a discharge exit 13c viewed from the air carrying-out direction is slit-shaped, has a first introduction means for spraying the mist toward the inner part of the second part and a second introduction means for introducing air, and both the means are arranged by turns. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008229536(A) 申请公布日期 2008.10.02
申请号 JP20070074393 申请日期 2007.03.22
申请人 FUJIKURA LTD 发明人 USUI HIROKI;GOTO KENJI
分类号 B05B7/08;B05B1/04 主分类号 B05B7/08
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