发明名称 Thin film capacitor
摘要 Disclosed is a thin film capacitor which can improve the uniformity of the capacitance while keeping a high capacitance. The thin film capacitor has a lower electrode serving as a trench forming layer where a trench pattern is to be formed, a dielectric film so provided as to cover the lower electrode, and an upper electrode laminated in order on the entire top surface of a substrate. The trench pattern is configured to have a first pattern and a second pattern separate from the first pattern. The first pattern has a plurality of protrusions provided upright at predetermined intervals, and the second pattern has a plurality of recesses provided at predetermined intervals. Trenches are each defined by the outer wall of each protrusion and the inner wall of each recess.
申请公布号 US2008237794(A1) 申请公布日期 2008.10.02
申请号 US20080078021 申请日期 2008.03.26
申请人 TDK CORPORATION 发明人 SHOJI SHIGERU
分类号 H01L21/02 主分类号 H01L21/02
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