Holding arrangement used in a CVD or a PVD installation comprises a holder having a section made from a dielectric material which is in contact with the substrate during a deposition process

摘要

Holding arrangement (1) comprises a holder (2) having a section made from a dielectric material which is in contact with the substrate (5) during a deposition process. An independent claim is also included for a chemical vapor deposition (CVD) or a physical vapor deposition (PVD) installation with the above holding arrangement.