| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor deposition technique capable of easily improving formation of a uniform thin film on a substrate and utilization efficiency of a vapor deposition material. SOLUTION: A crucible 10 for vapor deposition includes a bottom part 11, a side wall part 123, and a hole part Cv surrounded by the inner surface of the bottom part 11 and the side wall part 123, and formed along a prescribed axis. The hole part Cv has an opening OP positioned on a side opposite to the bottom part 11, a first region (for example, a lower part hole region 12a) where the sectional area perpendicular to the prescribed axis (for example, the axis P) of the hole part Cv is approximately fixed from the bottom part 11 side to the opening OP side, and a second region (for example, an upper part hole region 13a) where the sectional area at the plane perpendicular to the prescribed axis (for example, the axis P) of the hole part Cv is increased from the bottom part 11 side to the opening OP side. COPYRIGHT: (C)2009,JPO&INPIT
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