发明名称 Phase change memory device and method of fabricating the same
摘要 A phase change memory device and method of manufacturing the same is provided. A first electrode having a first surface is provided on a substrate. A second electrode having a second surface at a different level from the first surface is on the substrate. The second electrode may be spaced apart from the first electrode. A third electrode may be formed corresponding to the first electrode. A fourth electrode may be formed corresponding to the second electrode. A first phase change pattern may be interposed between the first surface and the third electrode. A second phase change pattern may be interposed between the second surface and the fourth electrode. Upper surfaces of the first and second phase change patterns may be on the same plane
申请公布号 US2008237566(A1) 申请公布日期 2008.10.02
申请号 US20070905244 申请日期 2007.09.28
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 AN HYEONG-GEUN;HORII HIDEKI;SHIN JONG-CHAN;AHN DONG-HO;BAE JUN-SOO;PARK JEONG-HEE
分类号 H01L47/00 主分类号 H01L47/00
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