发明名称 ELECTROSTATICK CHUCK AND PLASMA PROCESSING EQUIPMENT WITH ELECTROSTATICK CHUCK
摘要 <p>An electrostatick chuck which can enhance attraction force for any substrate. The electrostatick chuck (21) comprises a base mount (22) consisting of a body (23) and an insulating film (24), an electrode (25) and an insulating layer (26) laminated on the upper surface of the body (23), and a DC power supply (29) for applying a DC voltage to the electrode (25) wherein the insulating film (24) is formed on the upper surface of the body (23), the electrode (25) is formed on the upper surface of the insulating film (24) and the insulating layer (26) is formed on the upper surface of the electrode (25). The insulating layer (26) has a two-layerstructure of a polyimide layer (27) and a ceramic layer (28) wherein the polyimide layer (27) is formed on the upper surface of the electrode (25), and the ceramic layer (28) is formed on the upper surface of the polyimide layer (27). A substrate K is mounted on the surface of the ceramic layer (28).</p>
申请公布号 WO2008117607(A1) 申请公布日期 2008.10.02
申请号 WO2008JP53216 申请日期 2008.02.26
申请人 SUMITOMO PRECISION PRODUCTS CO., LTD.;HAYAMI, TOSHIHIRO 发明人 HAYAMI, TOSHIHIRO
分类号 H01L21/3065;H01L21/683 主分类号 H01L21/3065
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