发明名称 MOLD AND APPARATUS FOR FORMING A PATTERN, AND METHOD FOR FORMING THE PATTERN
摘要 <p>A mold for pattern formation, a pattern forming apparatus and a pattern forming method are provided to form a dummy pattern and/or a light blocking portion on the mold, thereby preventing resins positioned out of an effective pattern of the mold from hardening to remove a risk that an undesired pattern is formed on a substrate. A mold(10) for pattern formation includes a body(230,330), an effective pattern(EP), and a dummy pattern(DP). The effective pattern is on the body. The dummy pattern is formed along the circumference of the effective pattern. A light blocking portion(270,370) is in an area corresponding to the dummy pattern along the circumference of the effective pattern.</p>
申请公布号 KR20080088238(A) 申请公布日期 2008.10.02
申请号 KR20070030937 申请日期 2007.03.29
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK, DAE JIN;KIM, JANG KYUM
分类号 G02F1/13;H01L21/027 主分类号 G02F1/13
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