发明名称 |
MOLD AND APPARATUS FOR FORMING A PATTERN, AND METHOD FOR FORMING THE PATTERN |
摘要 |
<p>A mold for pattern formation, a pattern forming apparatus and a pattern forming method are provided to form a dummy pattern and/or a light blocking portion on the mold, thereby preventing resins positioned out of an effective pattern of the mold from hardening to remove a risk that an undesired pattern is formed on a substrate. A mold(10) for pattern formation includes a body(230,330), an effective pattern(EP), and a dummy pattern(DP). The effective pattern is on the body. The dummy pattern is formed along the circumference of the effective pattern. A light blocking portion(270,370) is in an area corresponding to the dummy pattern along the circumference of the effective pattern.</p> |
申请公布号 |
KR20080088238(A) |
申请公布日期 |
2008.10.02 |
申请号 |
KR20070030937 |
申请日期 |
2007.03.29 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
PARK, DAE JIN;KIM, JANG KYUM |
分类号 |
G02F1/13;H01L21/027 |
主分类号 |
G02F1/13 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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