| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve the layout of a pattern definition device in a particle-beam exposure apparatus to become a layout which lends itself to a production by inexpensive state-of-the-art processes. <P>SOLUTION: In a multi-beam deflector array device for use in a particle-beam exposure apparatus employing a beam lb of charged particles, the multi-beam deflector array device having a plate-like shape with a membrane region, the membrane region includes a first side 504 facing towards the incoming beam of particles, an array of apertures, each aperture allowing passage of a corresponding beamlet formed out of the beam of particles, a plurality of depressions 512, each depression being associated with at least one aperture, and an array of electrodes 511, each aperture being associated with at least one electrode 511 and each electrode 511 being located in a depression 512, the electrodes being configured to realize a non-deflecting state, wherein the particles that pass through the apertures are allowed to travel along a desired path, and a deflecting state, wherein the particles are deflected off the desired path. <P>COPYRIGHT: (C)2009,JPO&INPIT |
