发明名称 ANTIREFLECTION STRUCTURE, PROCESS FOR PRODUCING THE SAME AND PROCESS FOR PRODUCING OPTICAL FIBER
摘要 <P>PROBLEM TO BE SOLVED: To provide antireflection structure which can be easily produced, can exert an antireflection effect close to nonreflection and further can provide even a material of high melting point such as silica glass, with the minute conformation by transfer. <P>SOLUTION: The antireflection structure having a base material of glassy carbon, is characterized in that the base material at its surface is provided with an antireflection conformation composed of a cluster of minute projections each with a configuration tapering toward the apical end thereof. Preferably, the minute projections each have an average height of 200 to 3,000 nm, an average maximum diameter of 50 to 300 nm and an average pitch of 50 to 300 nm. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008233850(A) 申请公布日期 2008.10.02
申请号 JP20070208624 申请日期 2007.08.09
申请人 TOKYO UNIV OF SCIENCE 发明人 TANIGUCHI ATSUSHI
分类号 G02B1/11;G09F9/00 主分类号 G02B1/11
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