发明名称 FACILITY AND METHOD FOR PRODUCING HIGH-PURITY HYDROGEN CHLORIDE GAS AND METHOD FOR OPERATING THE FACILITY
摘要 PROBLEM TO BE SOLVED: To provide a facility for producing high-purity hydrogen chloride gas, from which hydrogen chloride gas can be stably supplied. SOLUTION: The facility for producing high-purity hydrogen chloride gas is provided with: a hydrogen chloride absorption column 31 in which impurity-containing hydrogen chloride gas D1 is absorbed in water or diluted hydrochloric acid; a hydrogen chloride distillation column 33 in which hydrochloric acid gas D4 whose purity is heightened by distilling concentrated hydrochloric acid D3 is distilled; and a hydrogen chloride circulation pipeline 34 for circulating at least a part of high-purity hydrogen chloride gas D9 to the upstream part of the hydrogen chloride absorption column 31. The amount of the high-purity hydrogen chloride gas to be produced is controlled by adjusting the amount of the high-purity hydrogen chloride gas to be circulated. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008230927(A) 申请公布日期 2008.10.02
申请号 JP20070075434 申请日期 2007.03.22
申请人 MITSUBISHI CHEMICALS CORP 发明人 HYODO NARUTOSHI
分类号 C01B7/07 主分类号 C01B7/07
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