发明名称 OPHTHALMOLOGIC DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To prevent an object from visually recognizing a prescribed shape pattern for projecting it to the cornea and to measure an eye to be examined without being prejudiced by a shape of a pattern member forming the prescribed shape pattern or letting instrumental myopia occur with a minimum structure. <P>SOLUTION: The device is provided with: a placido pattern projection system 100 for projecting a placido pattern to the cornea EC 1 of the eye E1 to be examined by a pattern part 101 provided with the placido pattern for measuring the cornea shape of the eye E1 to be examined; and a front eye part observation optical system 10 for observing the eye E1 to be examined by a cornea reflecting light where light flux of the placido pattern from the placido pattern projection system 100 is reflected by the cornea EC1 of the eye E1 to be examined. A pattern part 101 has the surface on the side of the eye E1 to be examined coated with paint which has a filter characteristic for transmitting an infrared ray and shielding visible ray. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008229095(A) 申请公布日期 2008.10.02
申请号 JP20070074327 申请日期 2007.03.22
申请人 TOPCON CORP 发明人 NAKAZAWA NAOKI;NAKAJIMA KOJI;MIHASHI TOSHIBUMI
分类号 A61B3/10 主分类号 A61B3/10
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