MULTICOLUMN ELECTRON BEAM EXPOSURE DEVICE AND MULTICOLUMN ELECTRON BEAM EXPOSURE METHOD

摘要

[PROBLEMS] To provide a multicolumn electron beam exposure device and a multicolumn electron beam exposure method which can improve precision in coupling of patterns between column cells. [MEANS FOR SOLVING PROBLEMS] The multicolumn electron beam exposure device has column cells, a wafer stage provided with an electron beam property detection part for measuring electron beam property, and a control part which measures the beam property of the electron beam used in all the column cells using the electron beam property detection part and adjusts the electron beam for each column cell so as to nearly equalize the property of the electron beam used in each column cell. The electron beam property can be any one of the beam position, beam intensity and beam shape of an emitted electron beam, and the electron beam property detection part can be a calibration chip or a Faraday cup where a reference mark is formed.