发明名称 PRESSURE CONTROL VALVE, AND PROCESSING DEVICE WITH PRESSURE CONTROL VALVE
摘要 PROBLEM TO BE SOLVED: To provide a pressure control valve in which service life of a seal member is elongated, in a pressure control valve used in a chamber performing predetermined processing with respect to material to be processed such as semiconductor wafer or the like. SOLUTION: The pressure control valve comprises: a valve body 61 having an opening 61b connecting a chamber 11 side with a side of exhaust devices 53, 54; a sealing valve element 62 closing the opening; the seal member 62a disposed to the sealing valve element and a protective seal 62b outside the seal member 62a; and a control valve element 63 with no seal member, for opening the opening 61b by predetermined opening. When plasma processing is performed, the control valve element opens the opening by the predetermined opening, and the sealing valve element 62 is evacuated in a valve evacuation part. Since the seal member is sealed to the inside of the protective seal in the valve evacuation part, the seal member is not exposed to the plasma or radical. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008232210(A) 申请公布日期 2008.10.02
申请号 JP20070070361 申请日期 2007.03.19
申请人 TOKYO ELECTRON LTD 发明人 NOZAWA TOSHIHISA
分类号 F16K3/02;C23C16/455;F16K3/04;F16K3/10;F16K51/02;H01L21/205;H01L21/3065 主分类号 F16K3/02
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