METHOD TO FORM A PATTERN OF FUNCTIONAL MATERIAL ON A SUBSTRATE USING A STAMP HAVING A SURFACE MODIFYING MATERIAL

摘要

The invention provides a method to form a pattern of functional material on a substrate. The method uses an elastomeric stamp having a relief structure with a raised surface and having a modulus of elasticity of at least 10 MegaPascal. A surface modifying material is applied to the relief structure and forms a layer at least on the raised surface. A composition of the functional material and a liquid is applied to the layer of the surface modifying material on the relief structure and the liquid is removed to form a film. The elastomeric stamp transfers the functional material from the raised surface to the substrate to form a pattern of the functional material on the substrate. The method is suitable for the fabrication of microcircuitry for electronic devices and components.