发明名称 CONTAMINATION PREVENTION SYSTEM, LITHOGRAPHIC APPARATUS, RADIATION SOURCE AND DEVICE MANUFACTURING METHOD
摘要 <p>The invention relates to a contamination prevention system (71) comprising a rotatable channel barrier (72), which is driven by means of a suitable bearing (73,74). The contamination prevention system (71) according to the invention is arranged with a cooling system (75) provided substantially in a vicinity of the bearing (73). The cooling system (75) may comprise conducts (75a) through which a suitable fluid coolant, notably gas, is provided. It is possible that the gas is supplied via a central channel (79a) provided in a shaft of the contamination prevention system. Additionally, a supplementary cooling system (76) may be provided arranged with suitable conducts (76a). Because this cooling system (76) is arranged on the periphery of the contamination prevention system (71), it may use water as a suitable coolant. The invention further relates to a lithographic projection apparatus, a radiation source and a method of manufacturing an integrated structure.</p>
申请公布号 WO2008118009(A1) 申请公布日期 2008.10.02
申请号 WO2008NL50160 申请日期 2008.03.20
申请人 ASML NETHERLANDS B.V.;WASSINK, ARNOUD CORNELIS 发明人 WASSINK, ARNOUD CORNELIS
分类号 G03F7/20;G21K1/00;G21K3/00 主分类号 G03F7/20
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