发明名称 APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR REGATHERING CHEMICALS THEREOF
摘要 A substrate processing apparatus is provided to reduce a rebounding effect with a chemical collection unit in a chemical collection process by rotating a spin head and the chemical collection unit. A nozzle unit(160) supplies at least one chemical onto a substrate. A spin head(130) is loaded on the substrate. The spin head has a rotating function and is moved upwardly and downwardly to at least one process position according to the chemical supplied from the nozzle unit. One or more chemical collection unit(110) is rotated in the same direction as the direction of the spin head, to collect the chemical supplied from the nozzle unit. A driving unit(104,140) moves upwardly and downwardly the spin head according to the chemicals and rotates the spin head and at least one chemical collection unit.
申请公布号 KR20080088190(A) 申请公布日期 2008.10.02
申请号 KR20070030777 申请日期 2007.03.29
申请人 SEMES CO., LTD. 发明人 SUNG, BO RAM CHAN
分类号 H01L21/304 主分类号 H01L21/304
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