| 摘要 |
A plasma processing device is provided to suppress degradation of a DC current flowing in an accommodation chamber for a long time. An accommodation chamber performs plasma processing by accommodating a substrate. A radio frequency electrode supplies radio frequency power into the accommodation chamber. A DC electrode applies a DC voltage into the accommodation chamber. A ground electrode of the applied DC voltage is prepared in the accommodation chamber. An exhaust device exhausts the accommodation chamber. A shielding member(46) is intervened between air flow and the ground electrode, and forms a groove type space(47) with the ground electrode, according to the air flow.
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