| 发明名称 |
OPTICAL ATTENUATOR DEVICE, RADIATION SYSTEM, AND LITHOGRAPHIC APPARATUS THEREWITH AND DEVICE MANUFACTURING METHOD |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an optical attenuator having one optical attenuator element or a plurality of optical attenuator elements arranged symmetrically to a center line of a beam and in a central part of the beam. <P>SOLUTION: The optical attenuator device operates to remove a part of a beam of radiation having intensity higher than average intensity by using at least one optical attenuator element. The device has applications in a radiation system, and/or a lithographic apparatus, in particular a scanning lithographic apparatus, wherein the optical attenuator element(s) are provided in a central part of the beam, for example perpendicularly to a scanning direction. <P>COPYRIGHT: (C)2009,JPO&INPIT |
| 申请公布号 |
JP2008235941(A) |
申请公布日期 |
2008.10.02 |
| 申请号 |
JP20080172173 |
申请日期 |
2008.07.01 |
| 申请人 |
ASML NETHERLANDS BV |
发明人 |
LUIJKX CORNELIS PETRUS ANDREAS MARIE;BANINE VADIM YEVGENYEVICH;BOTMA HAKO;VAN DUIJNHOVEN MARTINUS;MARKUS FRANCISCUS ANTONIUS EURLINGS;KRIKKE JAN JAAP;MULDER HEINE MELLE;MUIJDERMAN JOHANNES HENDRIK EVERHARDUS ALDEGONDA;VAN DUIJN CORNELIS JACOBUS |
| 分类号 |
G02B26/02;H01L21/027;G03F7/20 |
主分类号 |
G02B26/02 |
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