| 摘要 |
PROBLEM TO BE SOLVED: To provide an ion source and its filament exchange method capable of reducing working time for a filament exchange and improving an operation rate of an ion implanting device, by exchanging a plurality of filaments at the same time. SOLUTION: The ion source 1 is provided with a vacuum box 5 fitted adjacent to a plasma generation vessel 4, a plurality of support arms 7 fitted in the vacuum box 5 and supporting each of a plurality of filaments 3, a gate valve 6 arranged between the vacuum box 5 and the plasma generation vessel 4 and capable of opening/closing and airtightly separating the above, and a vacuum mechanism 9 for making the inside of the vacuum box 5 to be in a vacuum state. The vacuum box 5 is provided with a lid member 8 for releasing air. The gate valve 6 includes an opening part 14 for the support arms 7 and the filaments 3 to freely pass through. The support arms 7 are provided at the vacuum box 5 to make the filaments 3 fitted at tips pass through the opening part 14 of the gate valve in the open state, and move between the vacuum box 5 and the plasma generation vessel 4. COPYRIGHT: (C)2009,JPO&INPIT
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