APPARATUS FOR TREATING SUBSTRATE WITH NOZZLES AND CONTROL METHOD FOR NOZZLES THEREOF

摘要

A substrate processing apparatus including a plurality of nozzles and a nozzle control method are provided to supply uniformly chemicals by adjusting a rotary angle between a selected nozzle and a substrate. A substrate is loaded on a spin head(120). A nozzle unit(110) includes a plurality of nozzles for supplying chemicals to a substrate. The nozzles are installed at one rotary shaft. The nozzle unit rotates independently each of the nozzles according to a processing state. A selection unit selects one nozzle from the nozzles according to the processing state. A driving unit(114) rotates the rotary shaft to supply the chemicals from the selected nozzle to the substrate. A control unit controls the selection unit to select the nozzle, controls a rotary angle of the rotary shaft to supply uniformly the chemicals to the entire surface of the substrate.