| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an intermediate of an electronic element material enabling productivity to be increased while reducing damage to a substrate during formation of a functional layer through sputtering. <P>SOLUTION: The intermediate of the electronic element material is used for manufacturing the electronic element material and is constituted by forming a prescribed functional layer on a surface 100a of the substrate 100 by sputtering, wherein a conductive discharge induction member film 102a inducing the abnormal discharge generated during the execution of sputtering is formed in the prescribed area in the outer peripheral edge of the substrate 100 not yet formed with the functional layer. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
