| 摘要 |
PURPOSE:To obtain high precision in correcting flaws in all directions by providing plural secondary ionic detectors facing each other on the same line, increasing the detection efficiency of secondary ions, and detecting all pattern edges with excellent resolution. CONSTITUTION:A photomask 2 is set to a stage 3 so as to obtain the same coordinate axis as that of data obtained by a flaw checking device and is irradiated with ionic beams from an ionic source 4. Arising secondary ions are detected and a flaw part is displayed on a CRT 6 as a secondary ionic image. In this time, the arising secondary ions are detected by two secondary ionic detectors 5 and 11 facing other on the same line, and this obtained information is processed and displayed on the CRT 6. According to the directions of the pattern edges, either of detectors is selected, or both pieces of information are obtained to process an image simultaneously. Thus, an optimum image is always obtained, and all pattern edges are detected with an excellent resolution, so that a pattern is corrected with the high precision in a correcting process. |
