| 摘要 |
PURPOSE:To retrieve even a small defect speedily and accurately and to improve efficiency in correction and reliability by providing a relatively large false defect on the photomask. CONSTITUTION:The relatively large false defect as a mark can be made in a part where a device function of the mask to be corrected is not hindered; the size of the entire defect and its position are stored, and a detection start point is positioned at a point which corresponds to a correcting device. A defect of a large size is retrieved by a low magnification objective lens and is corrected; additionally, if there is a defect of a small size, the position of the base of the correcting device is corrected based on the false defect, the low magnification objective lens is exchanged for a high magnification objective lens, and then the defect of the small size is retrieved to be corrected. In this constitution, a defect can be speedily and accurately retrieved and corrected. |
