| 摘要 |
PURPOSE:To provide the positive type resist compsn. which has various excellent characteristics, such as sensitivity, residual film rate, resolution, heat resistance, and preservable stability, and is suitable for fine working particularly to <=1mum by incorporating specific quinone diazide sulfonate ester as a photosensitive agent into the compsn. CONSTITUTION:The quinone diazide sulfonate ester of the compd. expressed by general formula (I) or (II) is incorporated as the photosensitive agent into the positive type resist compsn. contg. an alkaline-soluble phenolic resin and the photosensitive agent. The compd. of the general formula (I) which is a raw material is required to have 3 to 4 pieces of the hydroxyl groups to be incorporated into one molecule and 0 to 4 pieces of substituents, exclusive of the hydroxyl groups bonded to phenolic nuclei. The compd. of the general formula (II) is required to have 5 pieces of the hydroxyl groups to be incorporated into one molecule and 1 to 4 pieces of substituents, exclusive of the hydroxyl groups bonded to phenolic nuclei. |
