| 摘要 |
<p>An exposure apparatus (100) that forms a pattern by exposing a substrate (W) is equipped with a first platform tower (14) and a second platform tower (16) installed at a predetermined distance, and an exposure main section (18) arranged within the space between both platform towers (14, 16) that includes a plurality of high rigidity sections (24, 26, 28) each including a high rigidity component. Accordingly, it becomes possible to use a module (a high rigidity section) of the preceding generation even when the generation changes.</p> |
