An object of the present invention is to provide a lead-free bismuth glass wherein decrease of the degree of accuracy of the patterning is prevented. Specifically, the present invention provides a lead-free bismuth glass characterized in that said lead-free bismuth glass is used for an optical patterning glass material which is patterned by light irradiation and the optical-absorption coefficient to light with a wavelength of 365 nm is 300 to 3000 cm−1.
申请公布号
EP1973856(A1)
申请公布日期
2008.10.01
申请号
EP20060771557
申请日期
2006.05.26
申请人
E.I. DU PONT DE NEMOURS AND COMPANY;NIHON YAMAMURA GLASS CO. LTD.