Lithographic projection apparatus and device manufacturing method

摘要

A manufacturing method is utilized in lithographic projection apparatus in order to enable all aberrations to be compensated for but with those aberrations that are of most significance to the particular application (the particular pattern, illumination mode, etc.) being given precedence over aberrations that are of lesser significance in relation to that particular application. The method uses a substrate having a target portion for receiving an image, a mask for applying a pattern in accordance with a required patterning application, and a projection system to project a selected beam of radiation onto the mask to produce a specific required patterned beam providing an image of the pattern on the target portion. In order to compensate for the aberrations in a manner that gives precedence to those aberrations of particular significance to the required application, the method incorporates the steps of predicting projection system aberration changes with time, determining the application-specific effect on certain parameters of the image of such predicted projection system aberration changes with respect to certain measured aberration values, generating a control signal specific to the required patterned beam according to such predicted projection system aberration changes in the projection system aberrations with time and their application-specific effect on certain parameters of the image; and carrying out imaging adjustments in dependence on the control signal to compensate for the application-specific effect of the predicted changes in the aberrations on the image. The adjustments are therefore determined optimally for the given application.