APPARATUS AND METHOD FOR INSPECTING OVERLAY PATTERN IN SEMICONDUCTOR DEVICE

摘要

An apparatus and a method for inspecting an overlay pattern in a semiconductor device are provided to produce an overlay correction value from a plurality of overlay pattern images of a third image including a first and second images. A stage is used for supporting a wafer(100). A light source(400) generates first incident light and second incident light to be irradiated on the wafer. An optical module(200) projects a plurality of adjacent overlay patterns formed on the wafer by using first reflecting light and second reflecting light. An image pickup unit(300) obtains a first and second image signals corresponding to the overlay patterns. An image generation and combination unit(500) generates a first and second images corresponding to the overlay patterns by using the first and second image signals. The image generation and combination unit generates a third image by combining the first image with the second image. A reading unit(600) reads an error of the overlay patterns by using a position of an overlay pattern image extracted from the third image.