Method of forming a dielectric interlayer film with organosilicon precursors,申请号EP20020001014-传众专利搜索

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发明名称	Method of forming a dielectric interlayer film with organosilicon precursors
摘要
申请公布号	EP1225194(B1)	申请公布日期	2008.10.01
申请号	EP20020001014	申请日期	2002.01.17
申请人	AIR PRODUCTS AND CHEMICALS, INC.	发明人	VINCENT, JEAN LOUISE;O'NEILL, MARK LEONARD;WITHERS, HOWARD PAUL, JR.;BECK, SCOTT EDWARD;VRTIS, RAYMOND NICHOLAS
分类号	C08G77/04;B05D7/24;C23C16/40;H01L21/312;H01L21/316;H01L21/768;H01L23/522	主分类号	C08G77/04
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