发明名称 Illumination system
摘要 <p>An optical attenuator device operates to remove a part of a beam of radiation having a higher than average intensity using at least one optical attenuator element (4). The device has application in a radiation system, and/or a lithographic apparatus, in particular a scanning lithographic apparatus, wherein the optical attenuator element(s) are provided in a central part of the beam, for example perpendicularly to a scanning direction.</p>
申请公布号 EP1975722(A2) 申请公布日期 2008.10.01
申请号 EP20080075593 申请日期 2004.12.21
申请人 ASML NETHERLANDS BV 发明人 LUIJKX, CORNELIS PETRUS ANDREAS MARIE;BOTMA, HAKO;BANINE, VADIM YEVGENYEVICH;VAN DUIJNHOVEN, MARTINUS;KRIKKE, JAN JAAP;MULDER, HEINE MELLE;MUIDERMAN, JOHANNES HENDRICK EVERARDUS ALDEGONDA;VAN DUIJN, CORNELIS JACOBUS;EURLINGS, MARKUS FRANCISCUS ANTONIUS
分类号 G02B26/02;G03F7/20 主分类号 G02B26/02
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