发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 A substrate processing apparatus is provided to improve substrate processing performance by reducing a waiting time of a process chamber during a substrate loading period of a load lock chamber. One or more process chambers(120a,120b) include substrate loading parts for loading a plurality of substrates. A plurality of load lock chambers(130a,130b) are formed to store the substrates to be loaded into the process chambers. The number of the substrates stored in the load lock chambers corresponds to a multiple of the substrates. A transfer chamber(110) is connected with each of the process chambers and each of the load lock chambers. A transfer robot(112) is installed in the inside of the transfer chamber to transfer the substrates.
申请公布号 KR20080087494(A) 申请公布日期 2008.10.01
申请号 KR20070029811 申请日期 2007.03.27
申请人 JUSUNG ENGINEERING CO., LTD. 发明人 KIM, YONG JIN;KIM, YOUNG ROK
分类号 H01L21/02 主分类号 H01L21/02
代理机构 代理人
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